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IBMM has facilities to expose a range of substrates to a range of light
sources. These include:
- UV light
- Typical applications include the exposure of photoresists
for photolithograpgy and the laser micromachining of polymers
and thin metal films
- Sources
- All the sources have typical spatial resolution 1 micron
- 442nm (Heidelberg mask writer)
- 350-450nm (EVG mask aligner)
- 248nm (Excimer laser)
- 198nm (Excimer laser
- Infra-Red
- Laser micromachining of virtually any material
- Source
- 800nm, typical spatial resolution 1 micron (Femtosecond
laser)
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