School of Electronic Engineering
Bangor University

Institute of Bioelectronic and Molecular Microsystems

Leybold Univex 350 Coating System
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Major features

  • Electron beam evaporation system
  • RF/DC magnetron sputterer
  • Deposition uniformity over 100% of a 125mm dia substrate is +/- 2% for both evaporation and sputtering.
  • Glow discharge cleaning system
 
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